ESC 214

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Patterning for Nanotechnology

This course is a hands-on treatment of all aspects of advanced pattern transfer and pattern transfer equipment including probe techniques; stamping and embossing; e-beam; and optical contact and stepper systems. The course is divided into five major sections: pattern generation processes; photolithography; particle beam lithographic techniques; probe pattern generation; and embossing lithography, step-and-flash, stamp lithography, and self assembled lithography.

ESC 214 Topics and Outline

Advanced Lithography Tool Technologies

Advanced Lithography General Information

Advanced Lithography and Resists

Novel Lithography Techniques